影像科学与光化学 ›› 2016, Vol. 34 ›› Issue (2): 123-135.DOI: 10.7517/j.issn.1674-0475.2016.02.123

• 综述 • 上一篇    下一篇

光刻胶用底部抗反射涂层研究进展

王宽1, 刘敬成1, 刘仁1, 穆启道2, 郑祥飞2, 纪昌炜2, 刘晓亚1   

  1. 1. 江南大学 化学与材料工程学院, 江苏 无锡 214122;
    2. 苏州瑞红电子化学品有限公司, 江苏 苏州 215124
  • 收稿日期:2015-11-26 修回日期:2016-01-21 出版日期:2016-03-15 发布日期:2016-03-15
  • 通讯作者: 刘敬成
  • 基金资助:

    国家重大科技专项(2010ZX02304)、江苏省产学研前瞻性联合研究项目(BY2015019-14)和中央高校基本科研业务费专项资金(JUSRP11514)资助

Research Progress of the Bottom Anti-reflective Coating for Photoresist

WANG Kuan1, LIU Jingcheng1, LIU Ren1, MU Qidao2, ZHENG Xiangfei2, JI Changwei2, LIU Xiaoya1   

  1. 1. School of Chemical and Material Engineering, Jiangnan University, Wuxi 214122, Jiangsu, P. R. China;
    2. Suzhou Rui Hong Electronic Chemicals Co., Ltd., Suzhou 215124, Jiangsu, P. R. China
  • Received:2015-11-26 Revised:2016-01-21 Online:2016-03-15 Published:2016-03-15

摘要:

随着微电子工业的蓬勃发展,光刻技术向着更高分辨率的方向迈进,运用底部抗反射涂层有效消除光刻技术中的驻波效应、凹缺效应,提高关键尺寸均一性和图案分辨率,引起了广大研究者的关注。本文简要介绍了光刻胶和光刻技术,底部抗反射涂层的分类、基本原理、刻蚀工艺以及其发展状况。重点对底部抗反射涂层的最新研究进展进行了总结,尤其是碱溶型底部抗反射涂层在光刻胶中的应用研究,最后对底部抗反射涂层的发展前景和方向进行了展望。

关键词: 光刻胶, 光刻技术, 底部抗反射涂层

Abstract:

With the rapid development of the micro-electronics industry, lithography technology has been moving forward to a higher resolution. Bottom anti-reflective coating has attracted great attention of researchers in terms of effectively eliminating the standing wave effect and the notching effect, improving the critical dimension uniformity and the patterning resolution. In this article, the photoresists and photolithography technique, and the classification, basic principle, etching process and development situation of the bottom anti-reflective coating are briefly reviewed. The latest research progress of the bottom anti-reflective coating is summarized in detail, especially the application of developable bottom anti-reflective coating in photoresist. Finally, the prospect and research directions of bottom anti-reflective coating in the future are also introduced.

Key words: photoresist, lithography, bottom anti-reflective coating