光敏型阴离子表面活性剂的合成及表面性能

doi:10.7517/j.issn.1674-0475.2017.05.012

影像科学与光化学 ›› 2017, Vol. 35 ›› Issue (6): 861-867.DOI: 10.7517/j.issn.1674-0475.2017.05.012

光敏型阴离子表面活性剂的合成及表面性能

支引娟¹, 姜小明¹, 郝春玲²

1. 贵州大学化学与化工学院, 贵州贵阳 550025;
2. 贵州大学农学院, 贵州贵阳 550025

收稿日期:2017-03-13 修回日期:2017-04-24 出版日期:2017-11-15 发布日期:2017-11-15
通讯作者: 姜小明
基金资助:
贵州省科学技术基金项目（20132097）、贵州省工业攻关项目（20103014）、贵州省教育厅自然科学研究项目（2011022）和贵阳市工业振兴科技计划项目（20111014-11）资助

Preparation and Surface Properties of a Photosensitive Anionic Surfactant

ZHI Yinjuan¹, JIANG Xiaoming¹, HAO Chunling²

1. Department of Chemistry and Chemical Engineering, Guizhou University, Guiyang 550025, Guizhou, P. R. China;
2. College of Agriculture, Guizhou University, Guiyang 550025, Guizhou, P. R. China

Received:2017-03-13 Revised:2017-04-24 Online:2017-11-15 Published:2017-11-15

摘要/Abstract

摘要：

本文制备了一种含有偶氮苯基团的阴离子表面活性剂，其表面活性及对方解石矿物的润湿性能，可以用紫外光照射进行调控。在紫外光照射后，表面活性剂的临界胶束浓度（cmc）、最低表面张力（γ_cmc）、分子极限占有面积（A_min）增大，饱和吸附量（Г_max）和降低表面张力的效率（pC₂₀）降低，对方解石的润湿能力增强。

关键词: 光敏, 偶氮苯, 表面活性剂, 光异构化, 表面张力, 接触角

Abstract:

A kind of photosensitive anionic surfactant was synthesized using 4-butylaniline, ethyl bromacetate andphenol. Its structure was identified by ¹HNMR and its properties were also measured. It was found that photoisomerization of the surfactant occurred under the irradiation of ultraviolet light and its time to make balance was about 40 min. After the irradiation of ultraviolet light, the values of cmc, γ_cmc and A_min increased and the values of Г_max, pC₂₀ and the contact angle on thecalcite surface decreased.

Key words: photosensitive, azobenzene, surfactant, photoisomerization, surface tension, contact angle

支引娟, 姜小明, 郝春玲. 光敏型阴离子表面活性剂的合成及表面性能[J]. 影像科学与光化学, 2017, 35(6): 861-867.

ZHI Yinjuan, JIANG Xiaoming, HAO Chunling. Preparation and Surface Properties of a Photosensitive Anionic Surfactant[J]. Imaging Science and Photochemistry, 2017, 35(6): 861-867.

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光敏型阴离子表面活性剂的合成及表面性能

Preparation and Surface Properties of a Photosensitive Anionic Surfactant

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