光刻胶用底部抗反射涂层研究进展
王宽, 刘敬成, 刘仁, 穆启道, 郑祥飞, 纪昌炜, 刘晓亚
Research Progress of the Bottom Anti-reflective Coating for Photoresist
WANG Kuan, LIU Jingcheng, LIU Ren, MU Qidao, ZHENG Xiangfei, JI Changwei, LIU Xiaoya
影像科学与光化学
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2016, (2): 123
-135
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DOI: 10.7517/j.issn.1674-0475.2016.02.123