Imaging Science and Photochemistry ›› 2018, Vol. 36 ›› Issue (5): 408-416.DOI: 10.7517/issn.1674-0475.180202

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Deep Photopolymerization Research of Highly Stable Thiol-ene System

CHEN Li1,2, WU Qingyang2, LIU Ren1,2, LI Zhiquan1,2   

  1. 1. International Research Center for Photoresponsive Molecules and Materials, Jiangnan University, Wuxi 214122, Jiangsu, P. R. China;
    2. School of Chemical and Material Engineering, Jiangnan University, Wuxi 214122, Jiangsu, P. R. China
  • Received:2018-02-02 Revised:2018-03-29 Online:2018-09-15 Published:2018-09-15

Abstract: Traditional thiol-ene photopolymerization system suffers from poor stability, odor issue and limited curing depth. In this paper, a highly stable thiol-ene photopolymerization system with low odor was prepared via optimization of monomers. Polymerization depth of 9.6 cm with about 80% double bond conversion was successfully achieved employing the strategy based on near-infrared light (NIR) induces up-conversion nanoparticles (UCNPs) luminescence. The cured sample exhibited good homogeneity and thermal stability (~335℃), which shows potential in the applications of photocuring of dental restoration materials and thick composites.

Key words: up-conversion, thiol-ene photopolymerization, deep photopolymerization, stability, near-infrared light