Preparation and Performance of UV-curing Waterborne Dry Film Photoresist Based on Acrylic Resins

doi:10.7517/j.issn.1674-0475.2016.02.172

Abstract

Abstract:

Water-soluble acrylic resins were synthesized by radical polymerization, which were used to prepare UV-curing waterborne dry film photoresist. FT-IR showed that no CC bonds existed in acrylic resins, indicated that the resins didn't take part in the UV-curing reaction. Test results exhibited that not only acid value and Weight-average Molecular Weight (M_w) of acrylic resins, but also exposure energy and developing time influenced the performance of dry film photoresist obviously. Take Ⅱ dry film photoresist for example, the optimal conditions were as follows. When the thickness of dry film photoresist was 30 micron, acid value ranged from 140~154, M_w was in the range of 6.00×10⁴~7.54×10⁴. Exposure energy and developing time should be 40~60 mJ/cm² and 40~50 s, respectively. In these conditions, good sidewall geometry and high resolution (30 μm) were obtained.

Key words: dry film photoresist, water-soluble acrylic resins, exposure energy, resolution

LI Weijie, ZHOU Guangda, LI Bogeng. Preparation and Performance of UV-curing Waterborne Dry Film Photoresist Based on Acrylic Resins[J]. Imaging Science and Photochemistry, 2016, 34(2): 172-180.

References

[1] 吴坚, 张诚. 我国电子化学品的现状与发展前景 [J]. 精细与专用化学品,2005,13 (23):1-7. Wu J, Zhang C. Status and trends of electronic chemicals in China [J]. Fine and Specialty Chemicals, 2005, 13(23): 1-7.
[2] Lin D J, Shieh J C, Lin H K. Aqueous developable photoresist containing weak alkali soluble or dispersible thiol compounds . US patent, 5019483.1991-05-28.
[3] 毛建国, 杨鉴惠. 丙烯酸酯光致抗蚀干膜制备 [J]. 信息记录材料,2000,1(3):14-16. Mao J G, Yang J H. Photoresist based on (meth)acrylic esters as membrane-resin [J]. Information Recording Materials, 2000, 1(3): 14-16.
[4] Asif A, Shi W. UV curable waterborne polyurethane acrylate dispersions based on hyperbranched aliphatic polyester: effect of molecular structure on physical and thermal properties [J]. Polymers for Advanced Technologies, 2004, 15(11): 669-675.
[5] Xie H Q, Zhan X G, Xie D. Study on esterification of acrylic phenolic resin by maleic anhydride and photocrosslinking properties of the alkali-soluble product [J]. Journal of Applied Polymer Science, 2005, 98(4): 1607-1614.
[6] Bai C Y, Zhang X Y, Dai J B, Li W H. Synthesis of a novel UV curable aqueous dispersion polyurethane PDHA-PEDA-PU and the properties of cured film [J]. Chinese Chemical Letters, 2006, 17 (3): 369-372.
[7] Tauber A, Scherzer T, Mehnert R. UV curing of aqueous polyurethane acrylate dispersions. A comparative study by real-time FTIR spectroscopy and pilot scale curing [J]. Journal of Coatings Technology, 2000, 72(911): 51-60.
[8] Lee C K, Don T M, Lai W C, Chen C C, Lin D J, Cheng L P. Preparation and properties of nano-silica modified negative acrylate photoresist [J]. Thin Solid Films, 2008, 516(23): 8399-8407.
[9] Lin H M, Hseih K H, Chang F C. Characterization of negative-type photoresists containing polyhedral oligomeric silsesquioxane methacrylate [J]. Microelectronic Engineering, 2008, 85(7): 1624-1628.
[10] Lee C K, Don T M, Lin D J, Chen C C, Cheng L P. Characterization of acrylic copolymers applied in negative-type photoresist via a ternary composition diagram [J]. Journal of Applied Polymer Science, 2008, 109(1): 467-474.
[11] Liu J, Zheng X, Li H, Liu R, Mu Q, Liu X. Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist [J]. Polymer Bulletin, 2015, 72(3): 523-533.
[12] 邓秉明, 叶代勇. 光致抗蚀干膜用水溶性丙烯酸树脂的优化合成 [J]. 热固性树脂, 2011,26 (1):25-30. Deng B M, Ye D Y. Optimum synthesis of waterborne acrylic resin for photoresist dry film [J]. Thermosettting Resin, 2011, 26(01): 25-30.
[13] Monroe B M, Weed G C. Photoinitiators for free-radical-initiated photoimaging systems[J]. Chemical Reviews, 1993, 93(1): 435-448.