Miscrostructure and Photoelectrical Performance of Titanium Oxide Film Prepared by In-Situ Oxidation on TiNi Alloy Surface

doi:10.7517/j.issn.1674-0475.2005.03.161

Imaging Science and Photochemistry ›› 2005, Vol. 23 ›› Issue (3): 161-166.DOI: 10.7517/j.issn.1674-0475.2005.03.161

Miscrostructure and Photoelectrical Performance of Titanium Oxide Film Prepared by In-Situ Oxidation on TiNi Alloy Surface

WANG Gai-tian¹, TU Jiang-ping¹, ZHANG Wen-kui², ZHANG Bo¹, YUAN Yong-feng¹, HUANG Hui², GAN Yong-ping²

1. Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, Zhejiang, P.R. China;
2. College of Chemical Engineering and Materials Science, Zhejiang University of Technology, Hangzhou 310032, Zhejiang, P.R. China

Received:2004-11-26 Revised:2005-01-06 Online:2005-05-23 Published:2005-05-23

Abstract

Abstract: The preparation, structure and photoelectric properties of titanium oxide films formed by in-situ direct thermally oxidation of TiNi alloys were investigated by AFM,XRD, EDS and photocurrent response. The results showed that the films is rutile TiO₂, and its crystal orentation is dependent on the thermal oxidation temperature. With increasing the oxidation temperature, the photocurrent and open-circuit voltage of TiO₂/TiNi electrode first increased, and then decreased. when the oxidation temperature was 700 ℃, the photocurrent of TiO₂/TiNi electrode was the highest.

Key words: TiNi alloy, titanium oxide, in-situ thermal oxidation, photocurrent response

CLC Number:

WANG Gai-tian, TU Jiang-ping, ZHANG Wen-kui, ZHANG Bo, YUAN Yong-feng, HUANG Hui, GAN Yong-ping. Miscrostructure and Photoelectrical Performance of Titanium Oxide Film Prepared by In-Situ Oxidation on TiNi Alloy Surface[J]. Imaging Science and Photochemistry, 2005, 23(3): 161-166.

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Miscrostructure and Photoelectrical Performance of Titanium Oxide Film Prepared by In-Situ Oxidation on TiNi Alloy Surface

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