Research Progress of the Bottom Anti-reflective Coating for Photoresist

doi:10.7517/j.issn.1674-0475.2016.02.123

Abstract

Abstract:

With the rapid development of the micro-electronics industry, lithography technology has been moving forward to a higher resolution. Bottom anti-reflective coating has attracted great attention of researchers in terms of effectively eliminating the standing wave effect and the notching effect, improving the critical dimension uniformity and the patterning resolution. In this article, the photoresists and photolithography technique, and the classification, basic principle, etching process and development situation of the bottom anti-reflective coating are briefly reviewed. The latest research progress of the bottom anti-reflective coating is summarized in detail, especially the application of developable bottom anti-reflective coating in photoresist. Finally, the prospect and research directions of bottom anti-reflective coating in the future are also introduced.

Key words: photoresist, lithography, bottom anti-reflective coating

WANG Kuan, LIU Jingcheng, LIU Ren, MU Qidao, ZHENG Xiangfei, JI Changwei, LIU Xiaoya. Research Progress of the Bottom Anti-reflective Coating for Photoresist[J]. Imaging Science and Photochemistry, 2016, 34(2): 123-135.

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