Imaging Science and Photochemistry ›› 2018, Vol. 36 ›› Issue (5): 434-442.DOI: 10.7517/issn.1674-0475.180407

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Study on the Preparation and Properties of Thiol-ene Photosensitive Resins for DLP 3D Printing

WANG Chong1,2, LIU Yulong2, LIU Ren1,2, LI Zhiquan1,2   

  1. 1. International Research Center for Photoresponsive Molecules and Materials, Jiangnan University, Wuxi 214122, Jiangsu, P. R. China;
    2. School of Chemical and Material Engineering, Jiangnan University, Wuxi 214122, Jiangsu, P. R. China
  • Received:2018-04-12 Revised:2018-06-19 Online:2018-09-15 Published:2018-09-15

Abstract: 3D printing based on digital light processing (DLP) affords rapid fabrication speeds, high dimensional accuracy and enables fabrication of objects with complex geometries. Therefore, developing photosensitive resins suitable for DLP 3D printing has become essential. Compared to traditional chain growth photopolymerization based on acrylates, thiol-ene photopolymerization features rapid reaction rates, high conversions, more homogeneous networks and low volume shrinkage due to its unique step growth polymerization mechanism. In this paper, a series of thiol-ene photosensitive resin were prepared and successfully applied to DLP printing to fabricate 3D objects. We explored the influence of the content of thiol monomers on the polymerization kinetics, thermomechanical properties, tensile properties, volume shrinkage and printing accuracy. The results showed that the increased amount of thiol monomers led to significantly increased double bond conversion, improved homogeneity of polymerization network, increased elongation at break and reduced volume shrinkage after printing.

Key words: 3D printing, digital light processing, photosensitive resin, thiol-ene reaction