Research on the Synthesis and Properties of a Matrix Resin to be Used for 248 nm Photoresist

doi:10.7517/j.issn.1674-0475.2013.05.349

Abstract

Abstract:

Precursor copolymer poly(p-tert-butoxycarbonyloxystyrene-co-N-hydroxy-5-norbornene-2,3-dicarboximido methacrylate) was prepared by free radical copolymerization of monomers p-tert-butoxycarbonyloxystyrene and N-hydroxy-5-norbornene-2,3-dicarboximido methacrylate. Target copolymer poly (p-hydroxystyrene-co-N-hydroxy-5-norbornene-2,3-dicarboximidomethacrylate-co-p-tert-butoxycarbonyloxystyrene) could be obtained by pyrolysis from the partial removal of the protective group tert-butoxycarbonyl of phenolic hydroxyl. It showed that the target copolymer with an appropriate molecular weight could be used as the matrix resin of 248 nm photoresist because of its good solubility in organic solvent, thermostability, film-forming characteristics, dry etching resistance, and optic density of 0.212 μm^-1 at 248 nm. In addition, the target copolymer had the property of acidolysis removal of the protective group. From the remaining film thickness ratio of the target copolymer after acidolysis, it could be inferred that the target polymer, with an appropriate molecular weight and an appropriate ratio of the protective group removal, could meet the requirements of exposure and development in the photolithographic processes of 248 nm photoresist.

Key words: 248 nm photoresist, matrix resin, poly (p-hydroxystyrene-co-N-hydroxy-5-norbornene-2,3-dicarboximido methacrylate-co-p-tert-butoxycarbonyloxystyrene)

CLC Number:

LIU Jian-guo, JIANG Ming, ZENG Xiao-yan. Research on the Synthesis and Properties of a Matrix Resin to be Used for 248 nm Photoresist[J]. Imaging Science and Photochemistry, 2013, 31(5): 349-360.

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