Synthesis of Naphthol-based Phenolic Resins and Its Application in Lift-off Photoresist

doi:10.7517/issn.1674-0475.200306

Imaging Science and Photochemistry ›› 2020, Vol. 38 ›› Issue (4): 609-614.DOI: 10.7517/issn.1674-0475.200306

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Synthesis of Naphthol-based Phenolic Resins and Its Application in Lift-off Photoresist

SUN Xiaoxia^1,2, SI Shuwei^1,2, ZHENG Xiangfei¹, LIU Jingcheng¹, MU Qidao²

1. School of Chemical and Materials Engineering, Jiangnan University, Wuxi 214122, Jiangsu, P. R. China;
2. Suzhou Ruihong Electronic Chemical Co., Ltd., Suzhou 215124, Jiangsu, P. R. China

Received:2020-03-06 Online:2020-07-15 Published:2020-07-15

Abstract

Abstract: Naphthol phenolic resins NAPR were synthesized through condensation of α-naphthol, m-cresol and formaldehyde, and the free phenolic hydroxyl groups of the resins were modified with BOC groups. FT-IR, ¹H NMR, GPC, and TGA were used to characterize the structure and properties of the resins. Lift-off photoresist was prepared with NAPR-BOC-2 as matrix resin.The resolution, morphology and heat resistance of photoresist were tested, and the maximum resolution of the photoresist was 0.6 μm, and the heat resistance was up to 130℃.

Key words: α-naphthol, phenolic resin, positive photoresist, NAPR-BOC, lift-off

SUN Xiaoxia, SI Shuwei, ZHENG Xiangfei, LIU Jingcheng, MU Qidao. Synthesis of Naphthol-based Phenolic Resins and Its Application in Lift-off Photoresist[J]. Imaging Science and Photochemistry, 2020, 38(4): 609-614.

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Synthesis of Naphthol-based Phenolic Resins and Its Application in Lift-off Photoresist

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