Imaging Science and Photochemistry ›› 2005, Vol. 23 ›› Issue (1): 66-70.DOI: 10.7517/j.issn.1674-0475.2005.01.66

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Micropatterning of Self-Assembly Film Comprising Pt-Nanoparticles

BAI Shuo, LU Cong-hua, CAO Wei-xiao   

  1. College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China
  • Received:2004-08-06 Revised:2004-10-13 Online:2005-01-23 Published:2005-01-23

Abstract: The photosensitive ultra-thin multilayer films were fabricated via self-assembly of Pt nanoparticles capped with mercaptoacetic acid (MA-PtNP) and nitro-substituted diazoresin(NDR). By means of selective exposure under UV light and developing in SDS aqueous solution the exposed regions of the film,in which the bond nature of the film has been converted from ionic to covalent,are not removed and are kept completely on the substrate,however the un-irradiated parts of the film can be removed completely to form fine images. The formed images were characterized with AFM and SEM.

Key words: nitro-substituted diazoresin, Pt nanoparticles, electrostatic self-assembly, micropatterning

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