THE STUDY ON A KIND OF WATER-BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST BASED ON NOVOLAC-HMMM SYSTEM

doi:10.7517/j.issn.1674-0475.1998.02.154

Imaging Science and Photochemistry ›› 1998, Vol. 16 ›› Issue (2): 154-160.DOI: 10.7517/j.issn.1674-0475.1998.02.154

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THE STUDY ON A KIND OF WATER-BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST BASED ON NOVOLAC-HMMM SYSTEM

WU Bing¹, LI Yuanchang¹, CHEN Ming¹, LIN Tianshu¹, HONG Xiaoyin¹, JIAO Xiaoming², CHENG Aiping², CHEN Jianjun²

1. Department of Chemistry, Tsinghua University, Beijing 100084, P. R. China;
2. The Institute of Chemical Reagent, Beijing 100022, P. R. China

Received:1997-07-17 Revised:1997-11-24 Online:1998-05-20 Published:1998-05-20

Abstract

Abstract: A kind of water-based negative chemical amplified photoresist, composed of Novolac HMMM as the film former, and diphenyliodonium salt as the photosensitive acid generator and phenothiazine as the photosensitizer, was formulated. The effects of photosensitive acid generators and photosensitizers on the photosensitivity of this system, and the levelling-effect in this system were investigated. Based on our research results, the pattern with line width as low as 1.24 μm was gained with the conventional UV photolithography under the optimum parameters.

Key words: chemical amplified photoresist, photosensitive acid generator, photosensitizer

WU Bing, LI Yuanchang, CHEN Ming, LIN Tianshu, HONG Xiaoyin, JIAO Xiaoming, CHENG Aiping, CHEN Jianjun. THE STUDY ON A KIND OF WATER-BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST BASED ON NOVOLAC-HMMM SYSTEM[J]. Imaging Science and Photochemistry, 1998, 16(2): 154-160.

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THE STUDY ON A KIND OF WATER-BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST BASED ON NOVOLAC-HMMM SYSTEM

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