%0 Journal Article %A HUO Yong-en %A JIA Yue %A WANG Li-yuan %T Progress of the Study on Nanoimprint Resists %D 2008 %R 10.7517/j.issn.1674-0475.2008.02.148 %J IMAGING SCIENCE AND PHOTOCHEMISTRY %P 148-156 %V 26 %N 2 %X Nanoimprint is one of the most promising next generation nanolithography technologies. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffraction or beam scatterings in other conventional techniques. This article introduces the basic princeples of nanoimprint technology and reviews the recent progress in the study of nanoimprint resists. Main factors affecting the performance of resists, including Tg temperature/thermal stability, viscosity/average molecular weight, etch resistance, etc, are discussed. The common resist materials for thermal nanoimprint and ultroviolet nanoimprint are introduced respectively, main parts of the resists including polymethacrylate, organic silicon modified polyacrylate, hybrane, polydimethylsilane, compounds with vinyl ether group, epoxy resin, etc. The advantages and disadvantages of the resist systems are also presented. The main problems existing in nanoimprint resists are introduced. The advantages and problems of nanoimprint technique are summed up in this article. %U http://www.yxkxyghx.org/EN/10.7517/j.issn.1674-0475.2008.02.148