THE STUDY ON A KIND OF WATER-BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST BASED ON NOVOLAC-HMMM SYSTEM
WU Bing, LI Yuanchang, CHEN Ming, LIN Tianshu, HONG Xiaoyin, JIAO Xiaoming, CHENG Aiping, CHEN Jianjun
Imaging Science and Photochemistry . 1998, (2): 154 -160 .  DOI: 10.7517/j.issn.1674-0475.1998.02.154

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