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    23 November 2011, Volume 29 Issue 6
    A Perspective on the Evolution of Printing Technology
    PU Jia-ling
    2011, 29(6):  401-416.  DOI: 10.7517/j.issn.1674-0475.2011.06.401
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    From the viewpoint of pure technology,printing can be defined as an additive process in which the intended contents or information are rendered on suitable substrate by selectively applying materials,and is within the scope of additive and area processing (or parallel processing) technology,characterized by high spacial resolution,throughput and low cost.Because of these features,printing is the important carrier which has created the modern civilization and has been the most important and long live media technology in the history of human being’s civilization as well.Today,it has found wide applications in areas such as surface finishing,printed electronics,super-large scale integrated circuit manufacturing,too.When judged as a media technology,visualization is believed the core role and function of printing.Putting colorant or ink on paper has been and will continue to be the key of the process.But in the areas of surface finishing or printed electronics,selectively applying specific functional elements,e.g.,protective,decorative,electronic,optoelectronic or other functions,onto suitable substrate is anticipated instead,in order to satisfy the requirements of end applications.In the area of super-large scale integrated circuit manufacturing,the significance of printing is manifested by its capability of creating micrometer or nanometer structures.This paper is intended to cast light over these aspects while progressing overview on the evolution of printing technology over the past thousands years and its tends in future.
    Molecular Structure of Advanced Photoresists
    XU Jian, CHEN Li, TIAN Kai-jun, HU Rui, LI Sha-yu, WANG Shuang-qing, YANG Guo-qiang
    2011, 29(6):  417-429.  DOI: 10.7517/j.issn.1674-0475.2011.06.417
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    This article reviews the development of lithography technology and photoresists as well as their molecular structure for 193 nm and extreme ultravioletlithography (EUVL,the next generation lithography).Especially,we describe the recent research and development of EUV photoresists in detail for the purpose of being conducive to the domestic research on advanced photoresists.
    Chemically Amplified Positive i-Line Photoresist Containing Iodonium Salt PAG and Dye Sensitizers
    LIU Juan, KONG Fan-rong, YU Jin-xing, WANG Li-yuan
    2011, 29(6):  430-437.  DOI: 10.7517/j.issn.1674-0475.2011.06.430
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    The photolysis of Bis (4-methylphenyl) iodonium triflate can be sensitized by dyes to undergo at around 365 nm and give rise to photoacid.Although the photoacid was combined by the dialkylamino group of the dye,it still can catalyze the decomposition of the chain of acetal polymer at postexposure bake (PEB) process.Comparatively,a little higher temperature and longer time are favorable to the process.So,a new type of chemically amplified positive i-line photoresist can be formed by phenolic resin,acetal polymer,iodonium salt PAG and dye sensitizer.Clear pattern with resolution of 0.8 μm was obtained in the lithographic experiment of the photoresist with the exposure dose of 100 mJ/cm2.The bleachability of the combination of the PAG and dye will help to improve the transparency of the resist materials.
    Automatic Unmanned Aerial Vehicle (UAV) Image Registration Based on Geometric Moment For Pre-classifying
    LU Yun-fei, ZHAO Hong-ying, LIU Da-ping, YAN Lei
    2011, 29(6):  438-448.  DOI: 10.7517/j.issn.1674-0475.2011.06.438
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    Recently,image registration technology is one of the rapid development field in image processing area.In remote sensing field,it is a significant step for image fusion,moving detection,image correction,image mosaic and so on.Although there are many methods for image registration in the world,different methods apply to different kinds of images,most time the methods are selected by human intervening but not automatically.It becomes a key issue that how to combine the advantages of different methods to achieve automatic image registration,especially for UAV images.In this paper,a pre-classifying method based on geometric moment is proposed after the comparison of image registration methods based on SIFT and SURF feature extraction,in order to decide which image registration method is the best one,thereby,achieve the whole automatic process.The experiments show that this automatic image registration method makes sure a good matching effect and at the same time it broaden the types of applicative images.
    The Preparation of UV Curable Hard Coatings on PET
    LU Jian-bo
    2011, 29(6):  449-455.  DOI: 10.7517/j.issn.1674-0475.2011.06.449
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    An ultraviolet curable transparent hard coating material has been developed to improve the abrasion resistance of PET.Functionalized polyurethane acrylate was used for the preparation of the hard coatings by UV curable technique.Factors that influence the properties of the PET hard coating were investigated,which includes photosensitive resin,reactive diluents,photoinitiator and additives.The tested results showed that: The prepared coating hardness 5H,adhesion 100%,abrasion resistance tested with the RCA tapes (500 g,1000 cycles),the transmittance of PET film without loss,as well as low surface tension,excellent flexibility and good chemical resistance.
    Synthesis of Ethylene Glycol Diglycidyl Ether and Study on Its Properties as Cationic Type UV-Curing Diluent
    LIU Shi-min, HUANG Bi-wu, CHENG Gui-liang
    2011, 29(6):  456-463.  DOI: 10.7517/j.issn.1674-0475.2011.06.456
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    Ethylene glycol diglycidyl ether was synthesized with ethylene glycol and epichlorohydrin as raw materials,with boron trifluoride ether complex as the catalyst,and with sodium hydroxide as the closed ring agent of producing ring reaction.The effects of the closed ring temperature,the dosage of the catalyst,the moral ratio of epichlorohydrin to ethylene glycol,and the moral ratio of sodium hydroxide to ethylene glycol on the reaction were studied,which showed that the preferable synthesizing conditions are 0.40% of the catalyst mass fraction,the moral ratio 2.4:1 of epichlorohydrin to ethylene glycol,the moral ratio 2.2:1 of sodium hydroxide to ethylene glycol,and 30℃ of the closed ring reaction temperature.Meanwhile,the cationic type UV-curing coating was prepared with ethylene glycol diglycidyl ether,epoxy resin (E-51) and triphenylsulphonium hexafluoroantimonate (UVI-6976).The mechanical properties of the UV-cured films were determined,giving 46.25 MPa of tensile strength,1487.26 MPa of Young’s modulus and 6.27% of elongation at tear.
    Discussion about the Hazards and Preventive Measures of Cine Film Acetic Acid Syndrome
    ZHOU Ya-jun, LI Yu-hu
    2011, 29(6):  464-470.  DOI: 10.7517/j.issn.1674-0475.2011.06.464
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    The cine film,as a kind of important historical and cultural heritage,is an important part of the archives protection works.The cellulose triacetate base cinefilm is the largest group in library collections,the acetic acid syndromes is produced from the hydrolysis of the cellulose triacetate ester base film under the storage condition of high temperature and humidity and other adverse environment.Acetic acid syndrome has become the major diseases which threaten the archives preservation of cellulose triacetate cine film,which is considered the cancer of cine film.This paper summarizes the hazards and analyses the reasons of acetic acid syndrome,and preventive measures are introduced.
    Study and Fabrication of High-Efficiency Organic Light-Emitting Diodes
    ZHOU Donying, LIAO Liang-sheng
    2011, 29(6):  471-471.  DOI: 10.7517/j.issn.1674-0475.2011.06.471
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