Imaging Science and Photochemistry ›› 2017, Vol. 35 ›› Issue (2): 168-173.DOI: 10.7517/j.issn.1674-0475.2017.02.168

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Study on Surface Treatment of the Imaging CdSe Mid-infrared Waveplate

YANG Hui1, ZHANG Zhiyong2,3, FENG Zhiwei2, XIONG Zhuyun1, ZENG Tixian1,3   

  1. 1. College of Physics and Space Science, China West Normal University, Nanchong 637002, Sichuan, P. R. China;
    2. National Astronomical Observatories, The Chinese Academy of Sciences, Beijing 100012, P. R. China;
    3. Key Laboratory of Solar Activity, National Astronomical Observatories, Chinese Academy of Sciences, Beijing 100012, P. R. China
  • Received:2017-01-22 Revised:2017-02-20 Online:2017-03-15 Published:2017-03-15

Abstract:

In this paper, a piece of CdSe single crystal with a size of Φ30×40 mm3 has been grown by the modified vertical unseeded vapor sublimation method. The accurate (001) face was obtained by X-ray diffraction test after crystal was cleavaged. A CdSe infrared waveplate with size of 20×20×3 mm3 was got by cuting, grinding and polishing. Then the surface of CdSe infrared waveplate was polished by chemical mechanical polishing method in liquid maxed alkaline solution and polishing liquid. The results show that polishing treatment can effectively reduce the scratch, defects and surface roughness of structure layer, and the infrared transmittance of the plate in the range of 2-20 μm is high(up to 70%), which can satisfy the processing requirements of infrared waveplate.

Key words: CdSe crystal, mid-infrared waveplate, chemical mechanical polishing