The Preparation and Properties of a Kind of Sulfonium Salt PAG Applicable for 193 nm Photoresist
WANG Wen-jun, LI Hua-min, WANG Li-yuan
Imaging Science and Photochemistry . 2005, (1): 48 -54 .  DOI: 10.7517/j.issn.1674-0475.2005.01.48

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