PREPARATION OF WATER BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST WITH HIGH GLASS TRANSITION TEMPERATURE
WANG Hui, YOU Fengxiang, CHEN Ming, LI Yuanchang, LU Jianping, HONG Xiaoyin, HUANG Zhiqi, HU Defu
Imaging Science and Photochemistry . 1998, (3): 245 -249 .  DOI: 10.7517/j.issn.1674-0475.1998.03.245

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