影像科学与光化学 ›› 1985, Vol. 3 ›› Issue (3): 44-49.DOI: 10.7517/j.issn.1674-0475.1985.03.44

• 研究论文 • 上一篇    下一篇

光化学反应中的磁场效应——吸附在硅胶表面上的芳砜的光解

佟振合, 陈申   

  1. 中国科学院感光化学研究所
  • 收稿日期:1984-07-03 修回日期:1985-02-02 出版日期:1985-08-20 发布日期:1985-08-20

MAGNETIC FIELD EFFECT ON PHOTOCHEMISTRY PHOTOLYSIS OF ARYL SULFONES ABSORBED ON SILICA GEL SURFACE

TONG ZHEN-HE   

  1. Institute of Photographic Chemistry, Academia Sinica
  • Received:1984-07-03 Revised:1985-02-02 Online:1985-08-20 Published:1985-08-20

摘要: 本文研究了吸附在硅胶表面上的芳砜的光化学,发现硅胶表面限制光解产生的自由基的移动,外加约150高斯的磁场显著地改变产物的分配比例,对这种磁场效应的机理进行了讨论。

Abstract: The photochemistry of aryl sulfones absorbed on the surface of silica gel has been investigated. It is observed that silica surface provides a cage environment which restricts the translational motion of the radical pair produced by photolysis of sulfones. A weak exteral magnetic field (-150G) may remarkably change the product distribution. The mechanism of the magnetic field effect on radical pair reactions is discussed.