影像科学与光化学 ›› 1983, Vol. 1 ›› Issue (1): 58-61.DOI: 10.7517/j.issn.1674-0475.1983.01.58

• 研究简报 • 上一篇    下一篇

聚N-乙烯咔唑光敏片的研制及其成像原理

丁瑞松, 杜金环, 邱家白   

  1. 中国科学院化学研究所
  • 收稿日期:1982-01-09 出版日期:1983-01-23 发布日期:1983-01-23

MECHANISM OF IMAGE FORMATION ON POLY-N-VINYLCARBAZOLE PHOTO-SENSITIVE FILM

DING RBI-SONG, DU JIN-HUAN, QIU JIA-BAI   

  1. Institute of Chemistry, Academia Sinica
  • Received:1982-01-09 Online:1983-01-23 Published:1983-01-23

摘要: 对聚N-乙烯咔唑(PVK)和四溴化碳体系的电荷转移复合物在紫外光照射下光解的化学过程反应进行了研究。顺磁共振谱证明,这种光化学反应是属自由基反应过程。这种光解反应生成聚N-乙烯咔唑阳离子自由基和四溴化碳阴离子自由基,同时放出质子酸H+·聚N-乙烯咔唑阳离子自由基与四溴化碳进一步反应产生3-溴代聚N-乙烯咔唑。利用这些光化学反应,我们以聚N-乙烯咔唑为主要原料研制出一种光敏显示材料——PVK光敏片,其中PVK是经过改性的,成本比较便宜。采用不同的酸敏指示剂可获得多种变色片。

Abstract: By utilizing the photo-chemical reaction of the charge-transfer complex formed by poly-N-vmylcarbazole (PVK) and carbon tetrabromide (CBr4), PVK photo-sensitive film was prepared. The photo-chemical reaction was studied by means of IK and UV-visible absorption spectroscopy and ESR. It was shown that free radicals were involved in this reaction. The conditions and processes of the image formation on PVK film were investigated.