甲酚醛树脂—HMMM负性水型化学增幅抗蚀剂的研究
吴兵, 李元昌, 陈明, 林天舒, 洪啸吟, 焦晓明, 程爱萍, 陈建军
THE STUDY ON A KIND OF WATER-BASED NEGATIVE CHEMICAL AMPLIFIED PHOTORESIST BASED ON NOVOLAC-HMMM SYSTEM
WU Bing, LI Yuanchang, CHEN Ming, LIN Tianshu, HONG Xiaoyin, JIAO Xiaoming, CHENG Aiping, CHEN Jianjun
影像科学与光化学
.
1998, (2): 154
-160
.
DOI: 10.7517/j.issn.1674-0475.1998.02.154
