Abstract: Polyion complexes based on diazo-resin were prepared from the reaction between diazo-resin as polycation and poly(sodium 4-styrene sulfonate) as polyanion in aqueous solution. The polyion complexes containing diazonium groups exhibit high photosensitive behaviors. Under irradiation of UV light, the complex, which dissolves in the shielding solvent composed of DMF-H₂O LiCl, will become indissoluble because the complex changes its crosslinking structure from ionic link to covalent bond. This character should be very important to develop a new photoimaging system.

Key words: diazo-resin, poly(sodium 4-styrene sulfonate), polyion complex