Photosensitivity Realization of the Conventional PS Plate by N2 Plasma Light Source Generated in Hollow Cathode Discharge

doi:10.7517/j.issn.1674-0475.2006.03.211

Imaging Science and Photochemistry ›› 2006, Vol. 24 ›› Issue (3): 211-217.DOI: 10.7517/j.issn.1674-0475.2006.03.211

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Photosensitivity Realization of the Conventional PS Plate by N₂ Plasma Light Source Generated in Hollow Cathode Discharge

LI Chao-yang, CHEN Qiang, ZHANG Guang-qiu

Plasma physics and material laboratory, Beijing Institute of Graphic Communication, Beijing 102600, P. R. China

Received:2006-01-09 Revised:2006-02-20 Online:2006-05-23 Published:2006-05-23

Abstract

Abstract: In this paper,the possible PS exposure source based on a novel N₂ plasma generated in direct current hollow cathode discharge(HCD) is investigated.With the applied voltage 580 V,current 1.8 A and working pressure 70 Pa an optical power density of 0.46 mW/cm² is obtained,in which the conventional PS plate can be well photosensitized.As a result the efficiency of photosensitivity this source is discussed in detail from the color density change and the FTIR analysis on the coating material.

Key words: hollow cathode discharge (HCD), PS plate, high frequency pulse plasma

CLC Number:

TQ57

LI Chao-yang, CHEN Qiang, ZHANG Guang-qiu. Photosensitivity Realization of the Conventional PS Plate by N₂ Plasma Light Source Generated in Hollow Cathode Discharge[J]. Imaging Science and Photochemistry, 2006, 24(3): 211-217.

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Photosensitivity Realization of the Conventional PS Plate by N₂ Plasma Light Source Generated in Hollow Cathode Discharge

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