[1] Kawamura K,Matsumoto H.In 45th annual conference of the Society for image science and Technology[C].Society for Imaging Science and Te chnology.East Rutherford,NJ.Springfield.VA.1992:337.
[2] Pohlers G,Scaiano J C,Sinta R,et al.Mechanism studied of photo-acid-generation from substituted 4,6-bis(trich-loromethyl)-1,3,5-triazines[J].Chem.Mater.,1997,9:1353.
[3] Pohlers G,Scaiano J C,Step E,et al.Ionic vs free radical pathw ays in the direct and sensitized photochemistry of 2-(4′-methoxynaphthyl)-4, 6-bis(trichloromethyl)-1,3,5-triazine:relevance for photoacid generation[J].J.Am.Chem.Soc.,1999,121:6167.
[4] Wang Huiming,Jiang Yongcao,Li Qingshan,et al.A novel visible photoinduced acid generation system[J].J.Appl.Polym.Sci.,in press.
[5] Smith G H,Bonham J A.DE-PS,2,306,248(3M)[P].1974.
[6] 吴兵,李元昌,陈明,等.甲酚醛树脂-HMMM负性水型化学增幅抗蚀剂的研究[J].感光科学与光化学,1998,16:154.Wu B,Li Y C,Chen M,et al.The study on a kind of water-based negative chemic al amplified photoresist based on novolac-HMMM system[J].Photographic Scien ce and Photochemistry,1998,16:154.
[7] 高放,徐锦旗,李立东,等.米氏酮和二苯基碘NFDA1盐光产酸体系及其在印刷版材中的应用研究[J].感光科学与光化学,2000,18:302.Gao F,Xu J Q,Li L D,et al.Study of photogenerating acid system of 4,4-(N,N ′-dimethylamino) benzophenone and diphenyliodonium salt and application to pri nting plate[J].Photographic Science and Photochemistry,2000,18:302.
[8] Takemura F.Dye-sensitized photo-polymerization of vinyl monomers.1.preliminary report on the polymerization of acrylonitrile by various dyes[J].Bull.Chem.Soc.,Jpn.,1962,35:1073.
[9] Ford J A Jr,Wilson C V,Young W R.The preparation of 2(5H)-Furano nes and dyes derived from them[J].J.Org.Chem.,1967,32:173. |