New Type Positivemolecular Glass Resists for Multi-Photon Lithography
LI Hao, JIN Feng, CHEN Wei-qiang, DUAN Xuan-ming
Imaging Science and Photochemistry . 2012, (5): 347 -357 .  DOI: 10.7517/j.issn.1674-0475.2012.05.347

京ICP备05002791-6号
Copyright © IMAGING SCIENCE AND PHOTOCHEMISTRY, All Rights Reserved.
Tel: 010-82543683　E-mail: xb@mail.ipc.ac.cn
Powered by Beijing Magtech Co., Ltd.