New Type Positivemolecular Glass Resists for Multi-Photon Lithography

doi:10.7517/j.issn.1674-0475.2012.05.347

Abstract

Abstract: Molecular glass and multi-photon lithography have attracted great interest in their respective research areas. In this study, we intended to apply molecular glass in multi-photon lithography. T-Boc protected calix[4]resorcinarene derivatives have been designed and used as molecular glass. Positive-tone molecular glass resist was built by this molecular glass and triphenysulfonium triflate used as photoacid generator. The ratio of compounds in this resist and the requirements of development process were optimized and discussed. Appling this novel resist in multi-photon lithography, feature size as small as 180 nm for line/space and integral 2D patterns were achieved after patterning and development. The results revealed the feasibility that calix[4]resorcinarene derivatives molecular glass resists can be applied in multi-photon lithography.

Key words: calix[4]resorcinarene, molecular glass, positive resists, multi-photon lithography

CLC Number:

TQ57
O43

LI Hao, JIN Feng, CHEN Wei-qiang, DUAN Xuan-ming. New Type Positivemolecular Glass Resists for Multi-Photon Lithography[J]. Imaging Science and Photochemistry, 2012, (5): 347-357.

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