STUDIES ON A KIND OF NEGATIVE PHOTORESIST BASED ON PHOTOSENSITIVE POLYIMIDES
LI Jiashen, LI Zuobang, ZHU Pukun, YANG Lifang, LI Fang, JIAO Xiaoming, CHENG Aiping, CHEN Jianjun
Imaging Science and Photochemistry . 1999, (4): 334 -337 .  DOI: 10.7517/j.issn.1674-0475.1999.04.334

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