Abstract: This paper reports two different types of poly(olefin sulfones), i.e. poly(cyclo-hexene aulfone) and poly(styrene sulfone), and their physical characteristics including data of elemental analysis, infrared spectrum, NMR spectrum, gel permeation chromatography and thermagra vimetric analysis.Poly(cyclohexene sulfone) and poly(styrene sulfone) have been investigated as positive electron beam resists. Poly(cyclohexene sulfone) was found to have a sensitivity of 5 × 10^-6/cm², a resolution of 0.75μm and contrast of about 1.5, whereas in the case of poly(styrene sulfone), these were 6 × 10^-5 c/cm², 0.36μm, and about 2.5, respectively.Poly(styrene sulfone)exhibits excellent dry etching resistance characteristics.Poly(cyclohexene sulfone) was used as a recording material in the focussed elec-trographic camera in intense magnetic fields. The resolution is higher than 1.5 μm.Poly(styrene sulfone) can be used as a deep UV resist. The resolution is 0.5 μm.