影像科学与光化学 ›› 1999, Vol. 17 ›› Issue (3): 247-252.DOI: 10.7517/j.issn.1674-0475.1999.03.247

• 研究论文 • 上一篇    下一篇

双咪唑光敏体系紫外光引发聚合甲基丙烯酸甲酯动力学和应用研究

徐锦棋, 高放, 杨永源, 李立东, 冯树京   

  1. 中国科学院感光化学研究所, 北京100101
  • 收稿日期:1998-09-10 修回日期:1998-11-10 出版日期:1999-08-20 发布日期:1999-08-20
  • 通讯作者: 杨永源
  • 基金资助:
    国家自然科学基金资助项目(批准号:59773011)

KINETIC AND APPLIED STUDY OF UV LIGHT PHOTOSENSITIVEINITIATING POLYMERIZATION OF METHYLMETHACRYLATEBY BIIMIDAZOLE PHOTOSENSITIVE SYSTEM

XU Jinqi, GAO Fang, YANG Yongyuan, LI Lidong, FENG Shujing   

  1. Institute of Photographic Chemistry, The Chinese Academy of Sciences, Beijing 100101, P.R. China
  • Received:1998-09-10 Revised:1998-11-10 Online:1999-08-20 Published:1999-08-20

摘要: 用光敏剂4,4′ 二(N,N′ 二甲基-氨基)苯甲酮(简称米氏酮,MK)、引发剂邻氯代六芳基双咪唑(o-Cl-HABI)和氢给体助引发剂十二烷基硫醇(SH)组成光敏引发体系。研究了在高压汞灯照射下,甲基丙烯酸甲酯(MMA)光聚合速率和该敏化体系每一个组分,包括MK、o-Cl-HABI、SH和MMA的关系,还研究了该体系在PS版材上的应用,并获得了很好的效果。

关键词: 双咪唑, 光聚合, 光敏引发体系

Abstract: The ultraviolet photosensitive initiating system is composed of 4,4’-bis(N,N’-dimethylamino) benzophenone (MK), 2-chlorohexaarylbiimidazole (o-Cl-HABI) and a hydrogen donor coinitiator ndodecyl mercaptan (SH). Under the irradiation by high pressure mercury lamp, the relationship between the photopolymerization rate of MMA and the concentration of each component of the system, including MK, o-Cl-HABI, SH and MMA, was studied. The excellent results have been obtained through studying the system’s application on PS printing plate.

Key words: biimidazole, photopolymerization, photosensitive initiating system