水溶性丙烯酸酯类感光干膜的制备及其性能研究

doi:10.7517/j.issn.1674-0475.2016.02.172

影像科学与光化学 ›› 2016, Vol. 34 ›› Issue (2): 172-180.DOI: 10.7517/j.issn.1674-0475.2016.02.172

水溶性丙烯酸酯类感光干膜的制备及其性能研究

李伟杰^1,2, 周光大¹, 李伯耿²

1. 杭州福斯特光伏材料股份有限公司, 浙江杭州 311300;
2. 浙江大学化学工程与生物工程学院, 浙江杭州 310027

收稿日期:2015-10-10 修回日期:2016-01-08 出版日期:2016-03-15 发布日期:2016-03-15
通讯作者: 周光大
基金资助:
浙江省博士后择优资助项目(BSH1502072)

Preparation and Performance of UV-curing Waterborne Dry Film Photoresist Based on Acrylic Resins

LI Weijie^1,2, ZHOU Guangda¹, LI Bogeng²

1. Hangzhou First PV Material Co., Ltd., Hangzhou 311300, Zhejiang, P. R. China;
2. College of Chemical and Biological Engineering, Zhejiang University, Hangzhou 310027, Zhejiang, P. R. China

Received:2015-10-10 Revised:2016-01-08 Online:2016-03-15 Published:2016-03-15

摘要/Abstract

摘要：

用溶液聚合法合成了水溶性丙烯酸树脂,并以该树脂为成膜物质制备了水溶性感光干膜。傅立叶-红外光谱和¹HNMR分析表明,丙烯酸树脂中不含CC不饱和双键,基本不参与紫外光固化反应。感光干膜性能测试表明,干膜中丙烯酸树脂的酸值及重均分子量会影响干膜的解析度和附着力等性能。进一步的研究表明,曝光能量、感光级数和显影时间也会直接影响干膜的性能。以30 μm厚度干膜Ⅱ为例,为获得较好的性能,丙烯酸树脂中甲基丙烯酸含量范围为21.5%~23.8%,重均分子量范围为6.00×10⁴~7.54×10⁴,曝光能量设定40~60 mJ/cm²,感光级数为18~23/41^ST,显影时间40~50 s,在此条件下,干膜的解析度可以达到30 μm,附着力为20 μm,干膜线路的侧边形貌和尺寸稳定性良好。此外,感光干膜中丙烯酸酯的比例和种类也会影响干膜的各方面性能,通过调节干膜中各组分含量的比例可以优化干膜性能。

关键词: 感光干膜, 水溶性丙烯酸树脂, 曝光能量, 解析度

Abstract:

Water-soluble acrylic resins were synthesized by radical polymerization, which were used to prepare UV-curing waterborne dry film photoresist. FT-IR showed that no CC bonds existed in acrylic resins, indicated that the resins didn't take part in the UV-curing reaction. Test results exhibited that not only acid value and Weight-average Molecular Weight (M_w) of acrylic resins, but also exposure energy and developing time influenced the performance of dry film photoresist obviously. Take Ⅱ dry film photoresist for example, the optimal conditions were as follows. When the thickness of dry film photoresist was 30 micron, acid value ranged from 140~154, M_w was in the range of 6.00×10⁴~7.54×10⁴. Exposure energy and developing time should be 40~60 mJ/cm² and 40~50 s, respectively. In these conditions, good sidewall geometry and high resolution (30 μm) were obtained.

Key words: dry film photoresist, water-soluble acrylic resins, exposure energy, resolution

李伟杰, 周光大, 李伯耿. 水溶性丙烯酸酯类感光干膜的制备及其性能研究[J]. 影像科学与光化学, 2016, 34(2): 172-180.

LI Weijie, ZHOU Guangda, LI Bogeng. Preparation and Performance of UV-curing Waterborne Dry Film Photoresist Based on Acrylic Resins[J]. Imaging Science and Photochemistry, 2016, 34(2): 172-180.

参考文献

[1] 吴坚, 张诚. 我国电子化学品的现状与发展前景 [J]. 精细与专用化学品,2005,13 (23):1-7. Wu J, Zhang C. Status and trends of electronic chemicals in China [J]. Fine and Specialty Chemicals, 2005, 13(23): 1-7.
[2] Lin D J, Shieh J C, Lin H K. Aqueous developable photoresist containing weak alkali soluble or dispersible thiol compounds . US patent, 5019483.1991-05-28.
[3] 毛建国, 杨鉴惠. 丙烯酸酯光致抗蚀干膜制备 [J]. 信息记录材料,2000,1(3):14-16. Mao J G, Yang J H. Photoresist based on (meth)acrylic esters as membrane-resin [J]. Information Recording Materials, 2000, 1(3): 14-16.
[4] Asif A, Shi W. UV curable waterborne polyurethane acrylate dispersions based on hyperbranched aliphatic polyester: effect of molecular structure on physical and thermal properties [J]. Polymers for Advanced Technologies, 2004, 15(11): 669-675.
[5] Xie H Q, Zhan X G, Xie D. Study on esterification of acrylic phenolic resin by maleic anhydride and photocrosslinking properties of the alkali-soluble product [J]. Journal of Applied Polymer Science, 2005, 98(4): 1607-1614.
[6] Bai C Y, Zhang X Y, Dai J B, Li W H. Synthesis of a novel UV curable aqueous dispersion polyurethane PDHA-PEDA-PU and the properties of cured film [J]. Chinese Chemical Letters, 2006, 17 (3): 369-372.
[7] Tauber A, Scherzer T, Mehnert R. UV curing of aqueous polyurethane acrylate dispersions. A comparative study by real-time FTIR spectroscopy and pilot scale curing [J]. Journal of Coatings Technology, 2000, 72(911): 51-60.
[8] Lee C K, Don T M, Lai W C, Chen C C, Lin D J, Cheng L P. Preparation and properties of nano-silica modified negative acrylate photoresist [J]. Thin Solid Films, 2008, 516(23): 8399-8407.
[9] Lin H M, Hseih K H, Chang F C. Characterization of negative-type photoresists containing polyhedral oligomeric silsesquioxane methacrylate [J]. Microelectronic Engineering, 2008, 85(7): 1624-1628.
[10] Lee C K, Don T M, Lin D J, Chen C C, Cheng L P. Characterization of acrylic copolymers applied in negative-type photoresist via a ternary composition diagram [J]. Journal of Applied Polymer Science, 2008, 109(1): 467-474.
[11] Liu J, Zheng X, Li H, Liu R, Mu Q, Liu X. Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist [J]. Polymer Bulletin, 2015, 72(3): 523-533.
[12] 邓秉明, 叶代勇. 光致抗蚀干膜用水溶性丙烯酸树脂的优化合成 [J]. 热固性树脂, 2011,26 (1):25-30. Deng B M, Ye D Y. Optimum synthesis of waterborne acrylic resin for photoresist dry film [J]. Thermosettting Resin, 2011, 26(01): 25-30.
[13] Monroe B M, Weed G C. Photoinitiators for free-radical-initiated photoimaging systems[J]. Chemical Reviews, 1993, 93(1): 435-448.

水溶性丙烯酸酯类感光干膜的制备及其性能研究

Preparation and Performance of UV-curing Waterborne Dry Film Photoresist Based on Acrylic Resins

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