Imaging Science and Photochemistry ›› 1985, Vol. 3 ›› Issue (4): 38-42.DOI: 10.7517/j.issn.1674-0475.1985.04.38

Previous Articles     Next Articles

IODINATED POLYSTYRENE: A NEGATIVE ELECTRON BEAM AND DEEP UV RESIST

GAO ZHI-MIN, YANG YONG-TUAN, FENG SHU-JING   

  1. Institute of Photographic Chemistry, Academia Sinica
  • Received:1984-10-05 Revised:1985-03-22 Online:1985-11-20 Published:1985-11-20

Abstract: Iodinated polystyrene (IPS) is synthesized by direct iodination of polystyrene and has been evaluated as negative electron beam and deep UV resist. The sensitivity of IPS to electron beam is 1.5×10-6 C/cm-2 and the resolution is 0.75 μm. The contrast is 2. It is found that the crosslinking does not proceed in vacuum after electron beam exposure.A pratical exposure time of 20 s was achieved for IPS with 500 W JB-05 deep UV printer and images of 1.0 μm lime pattern are obtained.If 1% IPS dichloroethane solution is irradiated by 2537Å UV lamp the solution will become violet which is attributed to iodine formation.