Imaging Science and Photochemistry ›› 2004, Vol. 22 ›› Issue (2): 108-113.DOI: 10.7517/j.issn.1674-0475.2004.02.108

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PREPARATION OF TiO2/SiO2 COMPLEX THIN FILM BY LIQUID PHASE DEPOSITION METHODS AND THEIR CHARACTERIZATION

ZHANG Chang-yuan, ZHANG Jin-long   

  1. Institute of Fine Chemicals, East China University of Science and Technology, Shanghai 200237, P.R. China
  • Received:2003-09-29 Revised:2003-11-18 Online:2004-03-23 Published:2004-03-23

Abstract: TiO2/SiO2 complex thin films were prepared by liquid phase deposition method at low-temperature.Their transparent,crystal structure and image were characterized by UV-Vis,XRD and SEM spectra,respectively.The evaluation of photocatalytic activities of deposited thin films were carried out by degradation of Rhodamine B in water solution under UV irradiation.The results exhibited that complex thin films prepared at room temperature have higher reactivitity for degradation of Rhodamine B.

Key words: liquid phase deposition, complex thin film, photocatalysis

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