[1] Frechet J M J,Ito H,Willison C G.Sensitive deep UV resist incorporating chemical amplification[J].Proc.Microcircuit Eng.,1982,82:260.
[2] MacDonald S A,Willison C G,Frechet J M J.Chemical amplification in high-resolution imaging systems[J].Acc.Chem.Res.,1994,27(6):151-158.
[3] Lin Q H,Simpson L,Steinhansler T,et al.Water-soluble resist for "Environmentally Friendly" lithography[C].In:Proc.SPIE,Metrology,Inspection,and Process Control for Microlithography X,1996,2725:308-319.
[4] Lin Q H,Steinhausler T,Simpson L.A water-castable,water-developable chemically amplified negative-tone resist[J].Chem.Mater.,1997,9:1725-1730.
[5] Harvard J M,Vladimirov N,Frechet J M J.Photoresists with reduced environmental impact:water-soluble resists based on photo-cross-linking of a sugar-containing polymethacrylate[J].Macromolecules,1999,32:86-94.
[6] Harvard J M,Shim S Y,Frechet J M J.Design of photoresists with reduced environmental impact.1.water-soluble resists based on photo-cross-linking of poly(vinyl alcohol)[J].Chem.Mater.,1999,11:719-725.
[7] Shirai M,Katsuta N,Tsunooka M.Photosensitive polymers bearing iminooxysulfonyl groups.A water soluble positive-type photoresist[J].Makromol.Chem.,1989,190(9):2099-2107.
[8] Guo Y Z,Fei F,Miyashita T.An environmentally friendly water-developable positive photoresist using LB films fabricated from methacrylamide copolymers[J].Bull.Chem.Soc.Jpn.,1999,72:2149-2153.
[9] Ichimura K.Preparation of water-soluble photoresist derived from poly(vinyl alcohol)[J].J.Polym.Sci.,Polym.Chem.,1982,20(6):1411-1417.
[10] Shirai M,Ma W G,Tsunooka M.Photocrosslinking of poly(N-phenylmathacrylamide) and its homologues[J].Polym.J.,1993,29(7):913-918.
[11] Matusche P,Nuyken O,Voit B.Water-soluble photoresins based on polymeric azo compounds[J].Reactive Polymers,1995,24(3):271-278.
[12] Jochen D,Oskar N,Peter S,et al.Water-soluble photoresist based on azosulfonates[J].Makromol.Chem.,1992,193:723-734.
[13] 胡友慧,兰伟,张晓萍.新型叠氮聚乙烯醇感光高分子的研究[J].西安交通大学学报,1998,32(8),77-80.Hu Y H,Lan W,Zhang X P.A novel photopolymer with improved sensitivity speed and stability[J].Journal of Xi'an Jiaotong University,1998,32(8):77-80.
[14] 胡友慧,兰伟,张晓萍.水溶性叠氮光敏剂的合成研究[J].感光材料,1998,4:24-26.HU Y H,Lan W,Zhang X P.Study on synthesis of water soluble azido photo-agent[J].Image Materials,1998,4:24-26.
[15] Shibuya T,Rong X J,Tochizawa N.New water-soluble photopolymer having azidobenzylidenerhodanine unit[J].J.Photopolym.Sci.Technol.,1999,12(2):377-382.
[16] Kyu H C,Gum J S,Jin K K,et al.A water-developable negative photoresist based on the photocrosslinking of Nphenylamide groups with reduced environmental impact[J].J.Appl.Polym.Sci.,2002,86:1172-1180.
[17] Harvard J M,Pasini D,Frechet J M J.The design and study of water-soluble positive-and negative-tone imaging materials[C].In:Proc.SPIE,Advances in Resist Technology and Processing XV,1998,3333:111-121.
[18] 严瑞瑄.水溶性高分子[M].北京:化学工业出版社,1998.48-52.Yan R X.Water-Soluble Polymer[M].Beijing:Chemical Industry Press,1998.48-52.
[19] Harvard J M,Yoshida M,Pasini D.Design of photoresists with reduced environmental impact.Ⅱ.Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline)[J].J.Polym.Sci.,Part A:Polym.Chem.,1999,37(9):1225-1236.
[20] Kim J B,Jang J H,Willison C G.Environmentally friendly negative resists based on acid-catalyzed acetalization for 193-nm lithography[J].Macromol.Rapid Commun.,2003,24:879-882.
[21] Yamada S,Medeiros D R,Patterson K.Positive and negative tone water processable photoresists:A progress report[C].In:Proc.SPIE,Advances in Resist Technology and Processing XV,1998,3333:245-252.
[22] Kim J B,Jung M H,Chang K H.A novel water developable photoresist for deep UV lithography[J].Eur.Polym.J.,1997,33 (8):1239-1243.
[23] Harvard J M,Frechet J M J.Design of a positive tone water-soluble resist[C].In:Proc.SPIE,Advances in Resist Technology and Processing XIV,1997,3049:437-447.
[24] Yamada S,Owens J,Rager T.Design and study of aqueous processable positive-tone photoresists[C].In:Proc.SPIE,Advances in Resist Technology and Processing XVII,2000,3999:569-578.
[25] Yamada S,Mrozek T.Toward environmentally friendly photolithographic materials:A new class of water-soluble photoresists[J].Macromolecules,2004,37(2):377-384. |
