Imaging Science and Photochemistry ›› 2003, Vol. 21 ›› Issue (4): 296-302.DOI: 10.7517/j.issn.1674-0475.2003.04.296

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THE PROGRESS OF ACID AMPLIFIER INVESTIGATIONS

WANG Wen-jun, ZHANG Gai-lian, WANG Li-yuan, YU Shang-xian   

  1. Chemistry Department, Beijing Normal University, Beijing 10875, P.R. China
  • Received:2003-03-26 Revised:2003-05-20 Online:2003-07-23 Published:2003-07-23

Abstract: This article reviews the various acid amplifiers which can effectively elevate the photosensitivity in the chemically amplified photoresist systems and their reaction mechanism of acid amplification.The application prospect,existing problem and future improvement of these materials are also discussed.

Key words: chemically amplified photoresist, acid amplifier, photosensitivity

CLC Number: