The Application of Photochromic Diarylethene Mask Layer in the Near-Field Optical Storage

doi:10.7517/j.issn.1674-0475.2007.03.204

Imaging Science and Photochemistry ›› 2007, Vol. 25 ›› Issue (3): 204-208.DOI: 10.7517/j.issn.1674-0475.2007.03.204

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The Application of Photochromic Diarylethene Mask Layer in the Near-Field Optical Storage

SHI Ming, NIU Li-hong, TONG Qing-xiao, TANG Ying-wu, ZHANG Fu-shi

Key Lab of Organic Optoelectronics & Molecular Engineering of Ministry of Education, Department of Chemistry, Tsinghua University, Beijing 100084, P. R. China

Received:2006-10-13 Revised:2006-12-20 Online:2007-05-23 Published:2007-05-23

Abstract

Abstract: Two kinds of diarylperfluorocyclopentenes which are suitable for the use of mask layer and recording layer materials in Super-rens were synthesized and the sample disc was developed as well.The initial near-field storage experiment demonstrated that the size of recording laser focus could be decreased by the photochromic diarylethenes mask layer.Thus the decreased recording information was obtained.It also showed the concentration of diarylethene in the mask layer strongly influenced the size of recording marks.An optimum concentration existed,in which the smallest size of recording information was obtained.

Key words: photochromism, mask layer, super-rens

CLC Number:

TQ57

SHI Ming, NIU Li-hong, TONG Qing-xiao, TANG Ying-wu, ZHANG Fu-shi. The Application of Photochromic Diarylethene Mask Layer in the Near-Field Optical Storage[J]. Imaging Science and Photochemistry, 2007, 25(3): 204-208.

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The Application of Photochromic Diarylethene Mask Layer in the Near-Field Optical Storage

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