STUDIES ON THE PHOTOINDUCED ETCHING EFFECT OF 5-NITROACENAPHTHENE IN THE DEVELOPMENT-FREE VAPOR PHOTOLITHOGRAPHY ——THE PHOTOOX1DATION OF 5-NITROACENAPHTHEN

doi:10.7517/j.issn.1674-0475.1992.04.332

Imaging Science and Photochemistry ›› 1992, Vol. 10 ›› Issue (4): 332-339.DOI: 10.7517/j.issn.1674-0475.1992.04.332

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STUDIES ON THE PHOTOINDUCED ETCHING EFFECT OF 5-NITROACENAPHTHENE IN THE DEVELOPMENT-FREE VAPOR PHOTOLITHOGRAPHY ——THE PHOTOOX1DATION OF 5-NITROACENAPHTHEN

HONG XIAO-YIN, LIU DAN, LI ZHONG-ZHE, LIU MI-XIN

Department of Chemistry, Qinghua University, Beijing 100084, P. R. China

Received:1991-09-11 Revised:1992-03-20 Online:1992-11-20 Published:1992-11-20

Abstract

Abstract: The photooxidation of 5-nitroacenaphthene plays an important role in the development-free vapor photolithography.The major oxidation products have been analysed by means of FT-1R, H-NMR, HPLC-MS.The results were compared with that of anthenic samples synthesized in our laboratory.It was shown that the majorphotooxidation products of 5-nitroacenaphthene are 5-nitroaoenaphthenol, 5-nitroacenaphthenone and 5-nitroacenaphthylene.

Key words: development-free photolithography, 5-nitroacenaphthene, photooxidation, 5-nitroacenaphthenol

HONG XIAO-YIN, LIU DAN, LI ZHONG-ZHE, LIU MI-XIN. STUDIES ON THE PHOTOINDUCED ETCHING EFFECT OF 5-NITROACENAPHTHENE IN THE DEVELOPMENT-FREE VAPOR PHOTOLITHOGRAPHY ——THE PHOTOOX1DATION OF 5-NITROACENAPHTHEN[J]. Imaging Science and Photochemistry, 1992, 10(4): 332-339.

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STUDIES ON THE PHOTOINDUCED ETCHING EFFECT OF 5-NITROACENAPHTHENE IN THE DEVELOPMENT-FREE VAPOR PHOTOLITHOGRAPHY ——THE PHOTOOX1DATION OF 5-NITROACENAPHTHEN

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