[1] 洪啸吟.光刻与光刻胶的研究与发展[J].高分子通报,1993,3:129~133 Hong X Y. Research & development of photolithography and photoresist [J]. Polymer Bulletin, 1993, 3:129~133 [2] Crivello J V, Lam J H W. Diaryliodonium salts. A new class of photoinitiators for cationic polymerization [J]. Macromolecules, 1977,10(6):1307~1315 [3] 王 慧,游凤祥,陈 明,等.高玻璃化温度化学增幅光致抗蚀剂的制备[J].感光科学与光化学,1998,3:245~249 Wang H, You F X, Chen M, et al. Preparation of water-based negative chemical amplified photoresist with high glass transition temperature [J]. Photographic Science and Photochemistry, 1998,3:245~249 [4] Chiang W Y, Lu J Y. Preparation and properties of Si-containing copolymer for near-UV resist I. poly(N-(4-hydroxyphenyl)maleimide-alt-p-trimethylsilylstyrene)[J].J.Polym. Sci.: Part A: Polym. Chem., 1991,29:399~410 [5] Hult A, Skolling O, Gothe S, et al. A new high-sensitivity, water-developable negative photoresist [C]. ACS Symp. Ser.(Polym. High Technol.: Electron. Photonics), 1987,346:162~169 [6] 洪啸吟,冯汉保.涂料化学[M].第1版.北京:科学出版社,1997.159~162 Hong X Y, Feng H B. Coating Chemistry[M]. First ed. Beijing: Science Press, 1997.159~162 |