碘代聚苯乙烯——负型电子束、远紫外抗蚀剂

doi:10.7517/j.issn.1674-0475.1985.04.38

影像科学与光化学 ›› 1985, Vol. 3 ›› Issue (4): 38-42.DOI: 10.7517/j.issn.1674-0475.1985.04.38

碘代聚苯乙烯——负型电子束、远紫外抗蚀剂

高志民, 杨永源, 冯树京

中国科学院感光化学研究所

收稿日期:1984-10-05 修回日期:1985-03-22 出版日期:1985-11-20 发布日期:1985-11-20

IODINATED POLYSTYRENE: A NEGATIVE ELECTRON BEAM AND DEEP UV RESIST

GAO ZHI-MIN, YANG YONG-TUAN, FENG SHU-JING

Institute of Photographic Chemistry, Academia Sinica

Received:1984-10-05 Revised:1985-03-22 Online:1985-11-20 Published:1985-11-20

摘要/Abstract

摘要： 本文合成了碘代聚苯乙烯,它是一种高灵敏度的负型电子束和远紫外抗蚀剂。作为电子束抗蚀剂,其灵敏度为1.5×10^-6C/cm²,分辨率为0.75μm,反差为2,曝光之后在真空中几乎没有后交联现象。作为负型远紫外抗蚀剂,使用500W JB-05型远紫外曝光机所需的曝光时间为20秒,能分辨1.0μm的线条。

Abstract: Iodinated polystyrene (IPS) is synthesized by direct iodination of polystyrene and has been evaluated as negative electron beam and deep UV resist. The sensitivity of IPS to electron beam is 1.5×10^-6 C/cm^-2 and the resolution is 0.75 μm. The contrast is 2. It is found that the crosslinking does not proceed in vacuum after electron beam exposure.A pratical exposure time of 20 s was achieved for IPS with 500 W JB-05 deep UV printer and images of 1.0 μm lime pattern are obtained.If 1% IPS dichloroethane solution is irradiated by 2537Å UV lamp the solution will become violet which is attributed to iodine formation.

高志民, 杨永源, 冯树京. 碘代聚苯乙烯——负型电子束、远紫外抗蚀剂[J]. 影像科学与光化学, 1985, 3(4): 38-42.

GAO ZHI-MIN, YANG YONG-TUAN, FENG SHU-JING. IODINATED POLYSTYRENE: A NEGATIVE ELECTRON BEAM AND DEEP UV RESIST[J]. Imaging Science and Photochemistry, 1985, 3(4): 38-42.

碘代聚苯乙烯——负型电子束、远紫外抗蚀剂

IODINATED POLYSTYRENE: A NEGATIVE ELECTRON BEAM AND DEEP UV RESIST

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