5-硝基二氢苊在无显影气相光刻中的光致诱蚀作用的研究——5-硝基二氢苊的光氧化反应

doi:10.7517/j.issn.1674-0475.1992.04.332

影像科学与光化学 ›› 1992, Vol. 10 ›› Issue (4): 332-339.DOI: 10.7517/j.issn.1674-0475.1992.04.332

5-硝基二氢苊在无显影气相光刻中的光致诱蚀作用的研究——5-硝基二氢苊的光氧化反应

洪啸吟, 刘丹, 李钟哲, 刘密新

清华大学化学系, 北京 100084

收稿日期:1991-09-11 修回日期:1992-03-20 出版日期:1992-11-20 发布日期:1992-11-20
通讯作者: 洪啸吟
基金资助:
国家自然科学基金;北京市重点自然科学基金资助项目

STUDIES ON THE PHOTOINDUCED ETCHING EFFECT OF 5-NITROACENAPHTHENE IN THE DEVELOPMENT-FREE VAPOR PHOTOLITHOGRAPHY ——THE PHOTOOX1DATION OF 5-NITROACENAPHTHEN

HONG XIAO-YIN, LIU DAN, LI ZHONG-ZHE, LIU MI-XIN

Department of Chemistry, Qinghua University, Beijing 100084, P. R. China

Received:1991-09-11 Revised:1992-03-20 Online:1992-11-20 Published:1992-11-20

摘要/Abstract

摘要： 5-硝基二氢苊的光氧化作用在无显影气相光刻中起着重要作用。我们通过红外,核磁共振、色质联用等手段对其光氧化产物进行了分析,并合成了有关化合物进行对照,确认5-硝基二氢苊的主要光氧化产物是5-硝基苊、5-硝基二氢苊酮、羟基-5-硝基二氢苊。

关键词: 无显影气相光刻、5-硝基二氢苊, 光氧化作用, 羟基-5-硝基二氢苊

Abstract: The photooxidation of 5-nitroacenaphthene plays an important role in the development-free vapor photolithography.The major oxidation products have been analysed by means of FT-1R, H-NMR, HPLC-MS.The results were compared with that of anthenic samples synthesized in our laboratory.It was shown that the majorphotooxidation products of 5-nitroacenaphthene are 5-nitroaoenaphthenol, 5-nitroacenaphthenone and 5-nitroacenaphthylene.

Key words: development-free photolithography, 5-nitroacenaphthene, photooxidation, 5-nitroacenaphthenol

洪啸吟, 刘丹, 李钟哲, 刘密新. 5-硝基二氢苊在无显影气相光刻中的光致诱蚀作用的研究——5-硝基二氢苊的光氧化反应[J]. 影像科学与光化学, 1992, 10(4): 332-339.

HONG XIAO-YIN, LIU DAN, LI ZHONG-ZHE, LIU MI-XIN. STUDIES ON THE PHOTOINDUCED ETCHING EFFECT OF 5-NITROACENAPHTHENE IN THE DEVELOPMENT-FREE VAPOR PHOTOLITHOGRAPHY ——THE PHOTOOX1DATION OF 5-NITROACENAPHTHEN[J]. Imaging Science and Photochemistry, 1992, 10(4): 332-339.

5-硝基二氢苊在无显影气相光刻中的光致诱蚀作用的研究——5-硝基二氢苊的光氧化反应

STUDIES ON THE PHOTOINDUCED ETCHING EFFECT OF 5-NITROACENAPHTHENE IN THE DEVELOPMENT-FREE VAPOR PHOTOLITHOGRAPHY ——THE PHOTOOX1DATION OF 5-NITROACENAPHTHEN

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