影像科学与光化学 ›› 2002, Vol. 20 ›› Issue (2): 88-95.DOI: 10.7517/j.issn.1674-0475.2002.02.88

• 研究论文 • 上一篇    下一篇

环氧有机硅阳离子型光敏预聚物的合成及其光敏性能的研究

黄毓礼, 柳冀, 王涛, 刘华峰   

  1. 北京化工大学, 材料科学与工程学院105号信箱, 北京, 100029
  • 收稿日期:2001-03-27 修回日期:2001-12-17 出版日期:2002-03-23 发布日期:2002-03-23
  • 通讯作者: 黄毓礼
  • 基金资助:
    国家自然科学基金资助项目(29776002)

SYNTHESIS AND PHOTOSENSITIVITY OF NOVEL PHOTOSENSITIVE EPOXY POLYSILOXANE OLIGOMER

HUANG Yu-li, LIU Ji, WANG Tao, LIU Hua-feng   

  1. College of Material Science and Engineering, Beijing University of Chemical Technology, Beijing 100029, P.R.China
  • Received:2001-03-27 Revised:2001-12-17 Online:2002-03-23 Published:2002-03-23

摘要: 合成了环氧有机硅光敏预聚物及阳离子光引发剂甲苯茂铁四氟硼酸盐 ,研究光引发剂种类、预聚物与单体配比、增感剂结构等因素对固化速度的影响 ,发现预聚物体系的感度较高 ,最小感度值为 1 65mJ/cm2 ;并讨论了甲苯茂铁四氟硼酸盐的暗聚合能力

关键词: 环氧有机硅, 阳离子光聚合, 阳离子光引发剂, 芳茂铁盐

Abstract: A photosensitive oligomer,cycloaliphatic epoxy polysiloxane,and a new kind of cationic photoinitiator,[CpFe(η 6 tol)]BF 4,was synthesized.The influences of photoinitiators,ratio of oligomer to monomer,and promoters on the rate of photoinitiated cationic polymerization of cycloaliphatic epoxy polysiloxane systems were studied.It shows that the polysiloxane is a high photosensitive oligomer,with a 165 mL/cm 2 optimized photosensitivity when initiated by diaryliodonium salt SR 1012 with sensitizer 651. Moreover,the ability of dark cure of the polysiloxane when initiated by [CpFe(η 6 tol)] BF 4was discussed.

Key words: cycloaliphatic epoxide, arene cyclopentadienyl iron complex, cationic polymerization, polysiloxane, sensitization

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