一种新型酞菁类光蚀刻记录材料的光生酸性质研究

doi:10.7517/j.issn.1674-0475.2007.02.142

影像科学与光化学 ›› 2007, Vol. 25 ›› Issue (2): 142-146.DOI: 10.7517/j.issn.1674-0475.2007.02.142

一种新型酞菁类光蚀刻记录材料的光生酸性质研究

黄蕾, 宾月景, 黄新, 张复实

清华大学, 化学系, 有机光电子与分子工程教育部重点实验室, 北京, 100084

收稿日期:2006-10-23 修回日期:2006-12-20 出版日期:2007-03-23 发布日期:2007-03-23
通讯作者: 张复实,E-mail:zhangfs@mail.tsinghua.edu.cn.
基金资助:
国家自然科学基金(20333080,20572059,20502013);国家基础研究项目(2007CB808000)

Studies on the Acid-Generation Properties of a New Phthalocyanine Derivative as Photoetching Recording Materials

HUANG Lei, BIN Yue-jing, HUANG Xin, ZHANG Fu-shi

Key Lab of Organic Optoelectronics and Molecular Engineering of Ministry of Education, Department of Chemistry, Tsinghua University, Beijing 100084, P. R. China

Received:2006-10-23 Revised:2006-12-20 Online:2007-03-23 Published:2007-03-23

摘要/Abstract

摘要： 通过研究对甲苯磺酸酯空心酞菁的性质,发现该化合物在紫外光照射下可生酸,是一种光生酸剂.由于酞菁类化合物本身具有光催化氧化反应的性能,因此这类光生酸剂在光蚀刻技术中将有很好的应用潜能.

关键词: 化学增幅抗蚀剂, 光生酸剂, 光催化, 酞菁

Abstract: A New Phthalocyanine derivative,the p-toluenesulfonylphthalocyanine was synthesized from metal-free phthalocyanine.The photolysis properties of the compound exposed with UV light was investigated.It was found that the p-toluenesulfonylphthalocyanine can generate acid after exposure.With good photocatalysis property,this photoacid-generator is applicable to chemically amplified photoresist.

Key words: chemical amplification, photoacid generator, photo-catalysis, phthalocyanine

中图分类号:

TQ57

黄蕾, 宾月景, 黄新, 张复实. 一种新型酞菁类光蚀刻记录材料的光生酸性质研究[J]. 影像科学与光化学, 2007, 25(2): 142-146.

HUANG Lei, BIN Yue-jing, HUANG Xin, ZHANG Fu-shi. Studies on the Acid-Generation Properties of a New Phthalocyanine Derivative as Photoetching Recording Materials[J]. Imaging Science and Photochemistry, 2007, 25(2): 142-146.

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一种新型酞菁类光蚀刻记录材料的光生酸性质研究

Studies on the Acid-Generation Properties of a New Phthalocyanine Derivative as Photoetching Recording Materials

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