萘酚基酚醛树脂的合成及其在lift-off光刻胶中的应用

doi:10.7517/issn.1674-0475.200306

影像科学与光化学 ›› 2020, Vol. 38 ›› Issue (4): 609-614.DOI: 10.7517/issn.1674-0475.200306

萘酚基酚醛树脂的合成及其在lift-off光刻胶中的应用

孙小侠^1,2, 司树伟^1,2, 郑祥飞¹, 刘敬成¹, 穆启道²

1. 江南大学化学与材料工程学院, 江苏无锡 214122;
2. 苏州瑞红电子化学品有限公司, 江苏苏州 215124

收稿日期:2020-03-06 出版日期:2020-07-15 发布日期:2020-07-15

Synthesis of Naphthol-based Phenolic Resins and Its Application in Lift-off Photoresist

SUN Xiaoxia^1,2, SI Shuwei^1,2, ZHENG Xiangfei¹, LIU Jingcheng¹, MU Qidao²

1. School of Chemical and Materials Engineering, Jiangnan University, Wuxi 214122, Jiangsu, P. R. China;
2. Suzhou Ruihong Electronic Chemical Co., Ltd., Suzhou 215124, Jiangsu, P. R. China

Received:2020-03-06 Online:2020-07-15 Published:2020-07-15

摘要/Abstract

摘要： 首先以α-萘酚、间甲酚、甲醛为单体，通过缩聚反应合成了萘酚基酚醛树脂NAPR，随后与二碳酸二叔丁酯（DBDC）反应制备了一系列t-BOC改性的萘酚基酚醛树脂NAPR-BOC。用红外（FT-IR）、核磁（¹H NMR）、凝胶色谱（GPC）、热失重分析（TGA）对其结构及性能进行了表征。以NAPR-BOC-2为基体树脂配制成lift-off光刻胶，测试了光刻胶的分辨率、形貌和耐热性，得到的光刻胶分辨率最大为0.6 μm，耐热可达130℃。

关键词: α-萘酚, 酚醛树脂, 正性光刻胶, NAPR-BOC, lift-off

Abstract: Naphthol phenolic resins NAPR were synthesized through condensation of α-naphthol, m-cresol and formaldehyde, and the free phenolic hydroxyl groups of the resins were modified with BOC groups. FT-IR, ¹H NMR, GPC, and TGA were used to characterize the structure and properties of the resins. Lift-off photoresist was prepared with NAPR-BOC-2 as matrix resin.The resolution, morphology and heat resistance of photoresist were tested, and the maximum resolution of the photoresist was 0.6 μm, and the heat resistance was up to 130℃.

Key words: α-naphthol, phenolic resin, positive photoresist, NAPR-BOC, lift-off

孙小侠, 司树伟, 郑祥飞, 刘敬成, 穆启道. 萘酚基酚醛树脂的合成及其在lift-off光刻胶中的应用[J]. 影像科学与光化学, 2020, 38(4): 609-614.

SUN Xiaoxia, SI Shuwei, ZHENG Xiangfei, LIU Jingcheng, MU Qidao. Synthesis of Naphthol-based Phenolic Resins and Its Application in Lift-off Photoresist[J]. Imaging Science and Photochemistry, 2020, 38(4): 609-614.

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萘酚基酚醛树脂的合成及其在lift-off光刻胶中的应用

Synthesis of Naphthol-based Phenolic Resins and Its Application in Lift-off Photoresist

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