多光子光刻用的杯[4]芳烃分子玻璃正性光刻胶

doi:10.7517/j.issn.1674-0475.2012.05.347

影像科学与光化学 ›› 2012, Vol. ›› Issue (5): 347-357.DOI: 10.7517/j.issn.1674-0475.2012.05.347

多光子光刻用的杯[4]芳烃分子玻璃正性光刻胶

李浩^1,2, 金峰¹, 陈卫强¹, 段宣明¹

1. 中国科学院理化技术研究所, 北京 100190;
2. 中国科学院研究生院, 北京 100049

收稿日期:2012-04-06 修回日期:2012-05-30 出版日期:2012-09-15 发布日期:2012-05-25
通讯作者: 陈卫强,E-mail:chenwq7315@mail.ipc.ac.cn;段宣明,E-mail:xmduan@mail.ipc.ac.cn.
基金资助:
科技部纳米重大研究计划(2010CB934103).

New Type Positivemolecular Glass Resists for Multi-Photon Lithography

LI Hao^1,2, JIN Feng¹, CHEN Wei-qiang¹, DUAN Xuan-ming¹

1. Laboratory of Organic Nanophotonics, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China;
2. Graduate University of Chinese Academy of Sciences, Beijing 100049, P. R. China

Received:2012-04-06 Revised:2012-05-30 Online:2012-09-15 Published:2012-05-25

摘要/Abstract

摘要： 分子玻璃材料和多光子光刻技术分别是近年来光刻胶和光刻技术领域的研究热点.本文对分子玻璃正性光刻胶在多光子光刻中的应用进行了探索,设计合成了叔丁氧基羰基保护的杯[4]芳烃衍生物分子玻璃材料,将其作为主体材料与光生酸剂三氟甲磺酸三苯锍鎓盐进行复配,制备了分子玻璃正性光刻胶,探讨并优化了光刻胶的成分配比及其在紫外光曝光下的显影工艺.利用780 nm波长飞秒激光对所制备的分子玻璃正性光刻胶进行了多光子光刻特性的评价,实验得到了最低线宽180 nm的线条和复杂的二维微结构图形,结果表明杯[4]芳烃衍生物分子玻璃正性光刻胶有望应用于多光子光刻技术.

关键词: 杯芳烃, 分子玻璃, 正性光刻胶, 多光子光刻

Abstract: Molecular glass and multi-photon lithography have attracted great interest in their respective research areas. In this study, we intended to apply molecular glass in multi-photon lithography. T-Boc protected calix[4]resorcinarene derivatives have been designed and used as molecular glass. Positive-tone molecular glass resist was built by this molecular glass and triphenysulfonium triflate used as photoacid generator. The ratio of compounds in this resist and the requirements of development process were optimized and discussed. Appling this novel resist in multi-photon lithography, feature size as small as 180 nm for line/space and integral 2D patterns were achieved after patterning and development. The results revealed the feasibility that calix[4]resorcinarene derivatives molecular glass resists can be applied in multi-photon lithography.

Key words: calix[4]resorcinarene, molecular glass, positive resists, multi-photon lithography

中图分类号:

TQ57
O43

李浩, 金峰, 陈卫强, 段宣明. 多光子光刻用的杯[4]芳烃分子玻璃正性光刻胶[J]. 影像科学与光化学, 2012, (5): 347-357.

LI Hao, JIN Feng, CHEN Wei-qiang, DUAN Xuan-ming. New Type Positivemolecular Glass Resists for Multi-Photon Lithography[J]. Imaging Science and Photochemistry, 2012, (5): 347-357.

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多光子光刻用的杯[4]芳烃分子玻璃正性光刻胶

New Type Positivemolecular Glass Resists for Multi-Photon Lithography

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