Imaging Science and Photochemistry ›› 1995, Vol. 13 ›› Issue (4): 358-361.DOI: 10.7517/j.issn.1674-0475.1995.04.358

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MEASURING QUANTUM YIELDS OF ACID EORMED IN PHOTOLYSIS OF ONIUM SALTS BY USING ABSORPTION SPECTROMETRY

DAI GUANG-SONG1, WU SHI-KANG1, W. Schnabel2   

  1. 1. Institute of Photographic Chemistry, The Chinese Academy of Sciences, Beijing 100101, P.R. China;
    2. Hahn-Meitner-Institut GmbH Berlin Germany
  • Received:1995-02-22 Revised:1995-06-16 Online:1995-11-20 Published:1995-11-20

Abstract: Onium salts with non-nucleophilic complex metal halide anions are good phtoto initiators,and have been extensively used in acid-catalyzed semiconductor lithography,Upon UVirradiation of these salts,protonic acid is formed. Measuring quantum yields of acid is veryimportant in order to improve the quality of photoresists. In this work, a new method ofmeasuring quantum yields of acid formed in photolysis of onium salts was described.Theamount of acid produced on irradiation was measured by a non-aqueous photometric methodusing sodium 4-nitrophenoxide as an indicator in acetonitrile standardized with trifluo-romethanesulphonic acid.The results determined have best repetition and higher sensitivitycompared with aqueous base-acid titration. The experimental results have been also discussed.

Key words: photolysis, onium compounds, absorption spectrometry, quantum yield