PHOTOSENSITIVE COMPLEXES OF PHENOLIC RESIN AND DIAZO RESIN OR DIAZONIUM SALT

doi:10.7517/j.issn.1674-0475.2000.02.165

Imaging Science and Photochemistry ›› 2000, Vol. 18 ›› Issue (2): 165-169.DOI: 10.7517/j.issn.1674-0475.2000.02.165

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PHOTOSENSITIVE COMPLEXES OF PHENOLIC RESIN AND DIAZO RESIN OR DIAZONIUM SALT

ZHANG Yong-jun, CAO Wei-xiao

College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China

Received:1999-06-07 Revised:1999-12-17 Online:2000-05-20 Published:2000-05-20

Abstract

Abstract: Complexes of phenolic resin and diazonium salt (PR-DS) or diazo resin (PR-DR) were prepared in aqueous solution. The coupling reaction between PR and DS (or DR) was suppressed successfully by addition of H₂SO₄ together with DS (or DR). The PR-DS dissolves in organic solvents is easier than PR-DR. The dissolution of PR-DS in DMF at room temperature reaches about 4.46%. Both complexes exhibit high photosensitive behaviors. Under irradiation of UV light, PR-DR changes its crosslinking structure from ionic bond to covalent bond and becomes insoluble in DMF. This character can be used in practice as a photo-imaging material.

Key words: diazonium salt, diazoresin, phenolic resin, photo-imaging system

CLC Number:

TQ57

ZHANG Yong-jun, CAO Wei-xiao. PHOTOSENSITIVE COMPLEXES OF PHENOLIC RESIN AND DIAZO RESIN OR DIAZONIUM SALT[J]. Imaging Science and Photochemistry, 2000, 18(2): 165-169.

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PHOTOSENSITIVE COMPLEXES OF PHENOLIC RESIN AND DIAZO RESIN OR DIAZONIUM SALT

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