Imaging Science and Photochemistry ›› 2007, Vol. 25 ›› Issue (1): 63-68.DOI: 10.7517/j.issn.1674-0475.2007.01.63

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Preparation of the ZnO:Al Thin Films by Sol-Gel and Study on Their Preparation Technics Conditions

WANG Wei1, WANG Bo-tao1, DONG Xiao-gang1, XUE Yu-zhi2   

  1. 1. Institute of Environment and Chemistry Engineering, Dalian Jiaotong University, Dalian 116028, Liaoning, P.R.China;
    2. Institute of Material Science and Engineering, Dalian Jiaotong University, Dalian 116028, Liaoning, P.R.China
  • Received:2006-07-20 Revised:2006-09-15 Online:2007-01-23 Published:2007-01-23

Abstract: The Al3+-doped ZnO transparent conducting films ZnO:Al(ZAO thin films) which have potential value with strongly preferred orientation of C-axis perpendicular to the substrate surface,high visible transmittance from 400—800 nm and high conductivity were prepared on glass substrates by Sol-Gel method.The influences that affected the films’ optical and electrical properties,such as the annealing temperature,the Al3+-doped quantity etc.were studied.The results proved that the best craft conditions to prepare ZAO thin films by Sol-Gel method were as follows: sol concentration 0.75 mol/L,doped quantity 1.5 atm%,coating layer 10 layers(thickness about 136 nm),annealing temperature 600 ℃.

Key words: Sol-Gel method, ZAO thin films, craft conditions

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