Abstract: The photolysis of Bis (4-methylphenyl) iodonium triflate can be sensitized by dyes to undergo at around 365 nm and give rise to photoacid.Although the photoacid was combined by the dialkylamino group of the dye,it still can catalyze the decomposition of the chain of acetal polymer at postexposure bake (PEB) process.Comparatively,a little higher temperature and longer time are favorable to the process.So,a new type of chemically amplified positive i-line photoresist can be formed by phenolic resin,acetal polymer,iodonium salt PAG and dye sensitizer.Clear pattern with resolution of 0.8 μm was obtained in the lithographic experiment of the photoresist with the exposure dose of 100 mJ/cm².The bleachability of the combination of the PAG and dye will help to improve the transparency of the resist materials.

Key words: sensitizer, PAG, dye, positive, i-line photoresist, acidolysis, acetal polymer