THE STUDY OF PHOTOSENSITIVITY OF Si CONTAINING ACRYLIC COMPOUND

doi:10.7517/j.issn.1674-0475.2000.03.229

Imaging Science and Photochemistry ›› 2000, Vol. 18 ›› Issue (3): 229-234.DOI: 10.7517/j.issn.1674-0475.2000.03.229

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THE STUDY OF PHOTOSENSITIVITY OF Si CONTAINING ACRYLIC COMPOUND

SUN Fang¹, HUANG Yu-li¹, A. Korigodski², G. Popova², V. Kireev²

1. School of Material Science and Engineering of Beijing University of Chemical Technology 105#, Beijing 100029, P.R.China;
2. D.Mendeleyev University of Chemical Technology of Russia, Mosccow, 125190, Russia

Received:1999-10-29 Revised:2000-06-08 Online:2000-08-20 Published:2000-08-20

Abstract

Abstract: The photosensitivity of Si containing acrylic oligomer ANS was investigated in terms of photoinitiators, the quantity of reactive diluent hydroxyethylacrylate (HEA) and the structure of ANS.It was shown that ANS has considerable photosensitivity. UV spectrum shows an absorption of λ max at 334 nm.The curing systems have the high curing rate when using 2,2-dimethoxy-2-phenylacetophenone (Iragacure 651) as the photoinitiator. The role of reactive diluent HEA is to decrease the viscosity of the curing systems, to improve the transparency of the cured film, and to optimize the property of the cured products.The photosensitivity has large variety when oligomers having different structures.

Key words: polysiloxane, acrylic oligomer, UV-curing

CLC Number:

TQ57

SUN Fang, HUANG Yu-li, A. Korigodski, G. Popova, V. Kireev. THE STUDY OF PHOTOSENSITIVITY OF Si CONTAINING ACRYLIC COMPOUND[J]. Imaging Science and Photochemistry, 2000, 18(3): 229-234.

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THE STUDY OF PHOTOSENSITIVITY OF Si CONTAINING ACRYLIC COMPOUND

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