影像科学与光化学 ›› 1993, Vol. 11 ›› Issue (2): 82-85.DOI: 10.7517/j.issn.1674-0475.1993.02.82

• 研究简报 • 上一篇    下一篇

高反差显影机理

季素雪, 马凤云, 陈四海, 任新民   

  1. 中国科学院感光化学研究所, 北京 100101
  • 收稿日期:1992-01-04 修回日期:1992-12-21 出版日期:1993-05-20 发布日期:1993-05-20
  • 通讯作者: 季素雪

THE MECHANISM OF HIGH CONTRAST DEVELOPMENT

JI SU-XUE, MA FENG-YUN, CHEN SI-HAI, REN XIN-MIN   

  1. Institute of Photographic Chemistry, Academia Sinica, Beijing 100101, P.R. China
  • Received:1992-01-04 Revised:1992-12-21 Online:1993-05-20 Published:1993-05-20

摘要: 剂或显影液中添加防灰雾剂或麟化合物。分析这两种化合物提高反差的作用机理就不难看出高反差显影在机理上存在着共同的特点。本文着重高反差显影共同特点的讨论,有关防灰雾剂及麟化合物在高反差显影过程中作用机理的详细讨论将在另文中进行。

关键词: 高反差, 感染显影, 防灰雾剂

Abstract: The development of emulsion layer is a gross process of the reduction of the emulsion grain population. Under the conventional development condition, the rate of density growth will give the information about the distribution of induction period among grains corresponding to the given exposure. The density difference among steps with different exposure depends on the relative rate of density growth of the steps, in turn depends on the different development behavior among grains. In the paper, the close relationship between the high contrast and the different development behavior among grains is discussed by taking two high contrast non-Lith systems as examples.

Key words: high contrast, infectious development, antifoggent