影像科学与光化学 ›› 1993, Vol. 11 ›› Issue (4): 307-317.DOI: 10.7517/j.issn.1674-0475.1993.04.307

• 研究论文 • 上一篇    下一篇

由抑制剂引起的高反差机理研究

陈四海, 季素雪, 任新民   

  1. 中国科学院感光化学研究所, 北京 100101
  • 收稿日期:1992-09-02 修回日期:1993-05-17 出版日期:1993-11-20 发布日期:1993-11-20
  • 通讯作者: 任新民
  • 基金资助:
    国家自然科学基金

THE MECHANISTIC STUDY OF HIGH CONSTRAST CAUSED BY INHIBITORS

CHEN SI-HAI, JI SU-XUE, REN XIN-MIN   

  1. Institute of Photographic Chemistry, Academia Sinica, Beijing 100101, P. R. China
  • Received:1992-09-02 Revised:1993-05-17 Online:1993-11-20 Published:1993-11-20

摘要: 本文利用吸附曲线及电化学的方法,研究了一系列抑制剂在银及溴化银上的吸附行为,将这些吸附性质与显影过程中相应的抑制剂存在时的显影结果对比,实验表明:只有当抑制剂在银上为中等的吸附,而在溴化银上吸附很小时,才可能利用抑制剂达到高反差。相应的机理及抑制剂在银上的吸附性质在文中也作了讨论。

关键词: 吸附, 高反差, 抑制剂, 银电极, 溴化银

Abstract: The adsorption behavior of a series of inhibitors on silver and silver bromide were investigated by using UV spectrophotometry and electrochemical techniques.In association with the sensitometric results obtained on using developers containing different inhibitors, it is concluded that high contrast caused by inhibitors can be achieved when the inhibitor moderately adsorbs on the latent image, coupled with a weak adsorption on silver bromide.The mechanism of high contrast and the adsorption properties of inhibitors on silver were also discussed.

Key words: adsorption, high contrast, inhibitor, silver electrode, silver bromide